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J. Chem. Phys. 125, 024703 (2006); http://dx.doi.org/10.1063/1.2212392 (11 pages)

Optimization of laser-focused deposition lines: Rydberg atoms

Nam A. Nguyen1, Moshe Shapiro2, and Paul Brumer1

1Chemical Physics Theory Group, Department of Chemistry, University of Toronto, Toronto, Ontario M5S 3H6, Canada and Center for Quantum Information and Quantum Control, University of Toronto, Toronto, Ontario M5S 3H6, Canada
2Chemical Physics Department, Weizmann Institute of Science, Rehovot 76100, Israel; Department of Chemistry, University of British Columbia, Vancouver V6T 1Z1, Canada; and Department of Physics and Astronomy, University of British Columbia, Vancouver V6T 1Z1, Canada

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(Received 4 April 2005; accepted 16 May 2006; published online 13 July 2006)

Optimally narrow nanoscale lines are computationally obtained for Rb Rydberg atoms deposited on surfaces. The use of optimized polychromatic fields is shown to allow lines as narrow as 1 nm in the absence of transverse velocities and shown to counter the deleterious effects of transverse velocities in laser cooled beams. Specifically, lines as narrow as 6.5 nm wide are obtained in the presence of transverse velocities associated with a temperature of 1 mK. Using this approach it is possible to deposit a single narrow line, even when the atomic beam is bigger than the period of the focusing lens, using as few as two, relatively weak, laser fields.

© 2006 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. THEORY
    1. Atom-field interaction
    2. Polarizability of a Rydberg atom
  3. COMPUTATIONAL METHODOLOGY
    1. Atomic density distribution
    2. Optimization methodology
  4. RESULTS AND DISCUSSIONS
    1. Perfectly collimated atomic beam
    2. Atomic beam with transverse velocities
      1. Optimized one field results
      2. Optimized polychromatic results
    3. Experimental considerations
  5. SUMMARY

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KEYWORDS and PACS

PACS

  • 81.16.Nd

    Micro- and nanolithography

  • 42.82.Cr

    Fabrication techniques; lithography, pattern transfer

  • 81.16.Mk

    Laser-assisted deposition

  • 81.15.Fg

    Pulsed laser ablation deposition

  • 79.20.Ds

    Laser-beam impact phenomena

  • 79.20.Rf

    Atomic, molecular, and ion beam impact and interactions with surfaces

  • 34.35.+a

    Interactions of atoms and molecules with surfaces

  • 32.80.-t

    Photoionization and excitation

ARTICLE DATA

PUBLICATION DATA

ISSN

0021-9606 (print)  
1089-7690 (online)

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